TEK-VAC INDUSTRIES Inc.
TEK-VAC INDUSTRIES, Inc. offers forty years of high vacuum and ultra-high vacuum technology experience to our customers in the form of production and R&D semiconductor process equipment. We offer systems which range from simple manual operation to fully automated turnkey. Our expertise includes design of operating system modes in broad temperature and pressure ranges, which provide accurate and reliable reproducibility.
- (631) 436-5100
- (631) 436-5154
- 176 Expressway Dr. South
Brentwood, NY 11717
United States
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product
Metal-Organic Compound Chemical Vapor Deposition
Model MOCVD-500-A
For Experimental growth of quality epitaxial layers III-V, II-VI compounds. Multi-Layer structures. Directly heated silicon carbide coated, high purity graphite or PBN susceptor. Low mass thermocouple probe immersed into susceptor. Broad temperature and pressure application. Highest quality materials utilized throughout.
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Star Cluster Systems
MODEL PDS-6000
One centrally located robot with four access ports. Four process chambers, one central loadlock, and one clean room load lock. Two 330 liter/second turbomolecular pump serving all process chambers. Options of 104 CFM Roots Blowers each backed by a 27 CFM rotary vane pumps.
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Liquid Phase Epitaxy Systems
MODEL LPE-3750 / 4750
The Tek-Vac LPE-3750 / 4750 Liquid-Phase Epitaxial Reactor utilizes a graphite slider boat technique to produce high quality semiconductors at high throughput rates. Automated Control provides uniform processing from run to run. An IBM PC, or compatible, uses Graphic Displays to develop process recipes and procedures. The LPE-3750 / 4750 can operate in a stand-alone mode.
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Gloveboxes & Gas Purification System
MODEL 440
Provides an inert environment for handling of highly reactive materials.Hermetically sealed chambers prohibitive to moisture and oxygen influx.Vacuum load-lock transfer chamber to avoid contamination.Optional purifier and regeneration systems are available.Three models and many options to suit your requirements.
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Plasma CVD & Etching Systems
MODEL DRIE-1000
A High Quality Plasma Deposition & Etch System, Ideal for R&D and Small Scale Production. Modified designs with capabilities of 12" wafers. Substrate heating to 500 C. Top loading / Optional loadlock. Multifunctional plasma network. Diversified pumping configurations. Variable electrode spacing. Customized features and components for specific applications.
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Chemical Vaper Deposition R&D System
MODEL CVD-300-M
High Temperature, 1080 C (24" Hot Zone: 126 Cubic In.) High Purity Quartz Tube with Water Cooled End Caps. Broad Pressure Range of Atmosphere to 10-3 Torr. Upgradable to High Vacuum. Computer Interfaceable. Small Footprint (26" x 48"), Portable with caster mounts.
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Residual Gas Analyzer System
LRGAS-100, -200, -300
Complete with RGA sensor, software, & electronics, vacuum pumping system, and mobile cart.Variety of sampling fittings.Automatic pump down.100, 200, or 300 amu sensor.Standard model contains an 80 L/s turbo pumping system with stainless steel manifold.Small footprint.Plugs into a common 120 VAC power outlet.Full front panel control.
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Photoresist Curing System
MODEL PRC-2000
A Compact Vacuum Bake Module, Ideal for Processing up to 12" x 12" wafers.Digital temperature control with P.I.D and auto tune features for precision control. Adjustable vacuum chucking pressure. Timed thermal contact provides excellent reproducibility. Automatic and manual versions. Safety interlocked Various fixture plates are available for multiple substrate processing.
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R&D Microwave PECVD System
Model PECVD-60-M
Retrofittable with RF-DC-Laser Ablation Modules. High Temperature Substrate Heating, 4" Diameter. High Power Magnetron Head, 600W Microprocessor Temperature Control. Standard Model equipped to handle four gas inputs, expandable. Adaptable for RF or DC Plasma. Top Loading, Compact Footprint. Broad Operating Pressure Range (10-4 to 760 torr).
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Various Engineering, Design & Manufacturing Services
GAS DISTRIBUTION
Tek-Vac will fabricate equipment subassemblies to customer specifictionsViewed here are two process gas distribution systems including mass flow controllers, isolation valves, and stainless steel manifolding. All fittings are metal sealing and all welds are full penetration.
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Plasma CVD & Reactive Ion Etching System
MODEL DRIE-1100-LL-ECR
The Tek-Vac DRIE-1100-LL-ECR series systems are designed for both high-density plasma chemical vapor deposition and reactive ion etching of sub-micron integrated circuits, optical devices and RF microwave electron devices.
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Power Supply, Flow Control & Flow Readout Device
FLO-MASTER FM-2001
A POWER SUPPLY, FLOW CONTROL, AND FLOW READOUT DEVICE, INTENDED TO CONTROL MOST COMMERCIALLY AVAILABLE MASS FLOW CONTROLLERS.
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Gas Metering Valves
VARI-VAC
The Tek-Vac Industries' VARI-VAC® is a smooth acting, bellows sealing gas metering valve available with manual, motor driven, solenoid, or electropneumatic controlling actuators.
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Burnbox & Scrubber Systems
MODEL BBS-10-LM
Safe, low costing, and minimal maintenance exhaust gas abatement equipment designed for years of continuous operation. Systems designed to significantly diminish toxic, corrosive, flammable, and pyrophoric gas exhaust to safe levels. Ideal for treating the exhaust effluents from process systems such as a deposition and etch reactor. Burnboxes, scrubbers and combinations are available, tailored to suit your exact requirements.
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Vacuum Test & Storage Chambers
Model R43 Altitude Test Chamber, Model S222-SE
Universal Application Low Pressure Testing and Processing Chambers
